Photomask and a method of manufacturing thereof comprising trape

Details Photomask and a method of manufacturing thereof comprising trape Photomask and a method of manufacturing thereof comprising trape

1992-08-21

1994-06-21

Rosasco, Steve

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, 430396, 156643, G03F 900

Patent

active

053227484

ABSTRACT:
A photomask includes a transparent substrate, a light shielding film formed on the substrate, and a transparent film formed on the light shielding film and the substrate. The light shielding film has a bottom in contact with the substrate, a side face at an acute angle to the bottom, and an upper face in parallel with the bottom and at an obtuse angle to the side face. According to the light shielding film having such a configuration, a phase shift portion of a predetermined width and thickness can be formed accurately in the periphery of the light shielding film. The inferior influence of reflecting light with respect to the pattern resolution can be reduced if films of low reflectance are provided in the upper and lower portions of the light shielding film to improve the pattern resolution. The method of manufacturing this photomask includes the steps of patterning the light shielding film having a trapezoid configuration in which the upper base is shorter than the lower base on a transparent substrate, and forming a transparent film at a temperature of not more than 250.degree. C. on the substrate and the light shielding film. The thermal distortion in the light shielding film can be suppressed effectively by the formation of a transparent film.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5127989 (1992-07-01), Haraguchi et al.

Affiliated with

Also associated with

Rating

Photomask and a method of manufacturing thereof comprising trape does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask and a method of manufacturing thereof comprising trape, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask and a method of manufacturing thereof comprising trape will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2219913