Electron-beam exposure apparatus and exposure method

Details Electron-beam exposure apparatus and exposure method Electron-beam exposure apparatus and exposure method

1997-11-17

2000-09-05

Berman, Jack

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504911, H01J 37302

Patent

active

061147087

ABSTRACT:
An electron-beam exposure apparatus, comprising an electron gun for emitting an electron beam, a first aperture for shaping the electron beam in a prescribed manner, and a second aperture, which is provided with an opening for varying the cross-sectional shape of the electron beam passing through the first aperture. The second aperture is provided with a variable-shape opening, partial one-shot exposure openings, beam spot dimension correction openings, and deflectors for deflecting the electron beam passing through the first aperture, said deflectors being disposed between the first and second apertures.

REFERENCES:
patent: 4413187 (1983-11-01), Akazawa et al.
patent: 5468969 (1995-11-01), Itoh et al.
patent: 5478698 (1995-12-01), Rostoker et al.
patent: 5886357 (1999-03-01), Kojima
Nakayama et al., "Electron-beam cell projection lithography: A new high-throughput electron-beam direct-writing technology using a specially tailored Si aperture", J. Vac. Sci. Technol., vol. B8, No. 6, 1836-1840 (1990).

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