Projection exposure apparatus

Photocopying – Projection printing and copying cameras – Illumination systems or details

Patent

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Details

355 53, G03B 2754, G03B 2742

Patent

active

053790901

ABSTRACT:
An apparatus includes an illumination system for illuminating a pattern formed on a mask with exposure light, a projection optical system for focusing and projecting an image of the mask pattern on a photosensitive substrate, and a stop member located on or near a plane having a Fourier transform relationship with a pattern surface of the mask. The illumination system has a variable optical member for setting variable the size of the exposure light passing through the plane having the Fourier transform relationship with the pattern surface of the mask. The stop member shields or reduces a portion near the central portion of the exposure light.

REFERENCES:
patent: 5121160 (1992-06-01), Sano et al.

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