Electron beam pattern generator control

Details Electron beam pattern generator control Electron beam pattern generator control

1987-05-11

1991-02-12

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Ion or electron beam irradiation

250398, H01J 3730

Patent

active

049926683

ABSTRACT:
A method is provided for controlling an electron beam pattern generator which writes a pattern on a substrate with an electron beam. A pattern store holds the defining coordinates of a set of trapezia 9, 13, 14, 15, 16 which together constitute the pattern. The set of trapezia in the store are divided into groups written in turn on the substrate, successive groups containing successively coarser 13, 14, 15, 16 to finer 9 pattern details. The groups are preceded in the pattern store by respective data words which instruct a trapezium generator to produce scanning steps of successive groups at successively higher to lower frequencies respectively. Coarse detail is thereby written quickly and fine detail receives the correct electron exposure.

REFERENCES:
patent: 3956635 (1976-05-01), Chang
patent: 4151422 (1979-04-01), Goto et al.
patent: 4199689 (1980-04-01), Takigawa
patent: 4280186 (1981-07-01), Hidao et al.
patent: 4445039 (1984-04-01), Yew
patent: 4477729 (1984-10-01), Chang
patent: 4530064 (1985-07-01), Takigawa et al.

Affiliated with

Also associated with

Rating

Electron beam pattern generator control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Electron beam pattern generator control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Electron beam pattern generator control will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-22135