Vanadium dioxide film deposition

Details Vanadium dioxide film deposition Vanadium dioxide film deposition

1985-05-21

1987-03-31

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

427162, 427164, 427255, 427314, C23C 1640

Patent

active

046542310

ABSTRACT:
A method of producing high quality stoichiometric thin films of vanadium dioxide by reactive evaporation utilizes an electron beam to evaporate a source of vanadium in a controlled, low pressure oxygen gas environment with the film being deposited at a predetermined rate onto a substrate which is heated to and maintained at a predetermined temperature above 500.degree. C.

REFERENCES:
patent: 3208873 (1965-09-01), Ames et al.
patent: 3658568 (1972-04-01), Donley
patent: 3850679 (1974-11-01), Sopko et al.
patent: 4400412 (1983-08-01), Scanlon et al.
Nyberg et al., "Summary Abstract: Preparation and Optical Properties of Rtively Evaporated VO.sub.2 Thin Films" J. Vac. Sci. Technol., vol. 2, No. 2, pp. 301-302, 1984.

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