Method for fabricating a photomask

Details Method for fabricating a photomask Method for fabricating a photomask

1998-11-04

2000-06-06

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

060716533

ABSTRACT:
A method for fabricating a photomask includes forming an anti-reflection layer on a transparent substrate. A transparent layer is formed on the anti-reflection layer. Patterning the transparent layer forms a transparent bar layer so that a portion of the ant-reflection layer is exposed. An opaque layer is formed over the substrate. A polishing process is performed to polish the opaque layer and the transparent bar layer so that a top portion of the transparent bar layer is polished and exposed. An etching back process is performed to remove a portion of the opaque layer so that the anti-reflection layer is exposed and the remains of the opaque layer forms a spacer with uniform thickness on each side of the transparent bar layer. The transparent bar layer is removed by etching so as to form the photomask.

REFERENCES:
patent: 5536606 (1996-07-01), Doan
patent: 5698349 (1997-12-01), Yang

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