Exposure data forming method, pattern forming method, pattern ex

Boots – shoes – and leggings

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

364490, 364491, 2504911, 2504922, G06F 1560

Patent

active

053372476

ABSTRACT:
An exposure data organizing method, and an exposure apparatus operable in accordance with the method, organizes exposure data defining a composite pattern to be exposed. The composite pattern comprises at least one compressed, repeating exposure pattern and a non-compressed, non-repeating exposure pattern each comprising plural predefined unit deflection region to which respectively corresponding portions of the exposure data relate. The exposure patterns are relatively arranged in accordance with the composite pattern and respective, individual identifying members are assigned thereto. Exposure order numbers then are assigned to the unit deflection regions, as identified by the respective individual identifying members and so as to define a sequential order of the exposure of the unit deflection regions, determined in accordance with minimizing the length of a path through which the exposure beam is deflected when proceeding from the exposure of one to the exposure of a next successive one of the unit deflection regions, for all of the unit deflection regions. The portions of the exposure data corresponding to the unit deflection regions are processed in the sequence defined by the exposure order numbers for controlling the exposure of each unit deflection region on the object and further the exposing beam is deflected in accordance with the zigzag path to the successive unit deflection regions.

REFERENCES:
patent: 4151421 (1979-04-01), Sumi
patent: 4259724 (1981-03-01), Sugiyama
patent: 4531191 (1985-07-01), Koyama
patent: 4586141 (1986-04-01), Yasuda et al.
patent: 4849901 (1989-07-01), Shimizu
patent: 4853870 (1989-08-01), Yasutake et al.
patent: 4878177 (1989-10-01), Ikenaga et al.
patent: 4950910 (1990-08-01), Yasuda et al.
patent: 5008830 (1991-04-01), Mortizumi et al.
patent: 5046012 (1991-09-01), Morishita
patent: 5253182 (1993-10-01), Suzuki
Patent Abstracts of Japan, vol. 11, No. 271 (E-536), Sep. 3, 1987 & JP-A-62 072 124 (Toshiba Corp.), Apr. 2, 1987.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure data forming method, pattern forming method, pattern ex does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure data forming method, pattern forming method, pattern ex, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure data forming method, pattern forming method, pattern ex will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-221141

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.