Reactor configuration for a liquid gasification process

Details Reactor configuration for a liquid gasification process Reactor configuration for a liquid gasification process

1999-02-04

2000-09-05

Mayekar, Kishor

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

B01J 1908

Patent

active

061138657

ABSTRACT:
The reactor configuration for a liquid gasification process includes an apparatus for liquid gasification such as that described in U.S. Pat. No. 5,159,900. Included in the apparatus for liquid gasification are a reaction chamber at least partially filled with liquid, a pair of electrodes, and means for creating an electrical arc between the electrodes. When the electrical arc is struck, carbon in the reaction chamber is ionized and vaporized while energy is dissipated in the form of high intensity light radiation. Electrons pass though the vaporized carbon, causing the carbon vapor to oxidize or burn releasing COH.sub.2 gas. The displacement of oxygen in the liquid by forced rapid oxidation is an endothermic reaction. The electrodes are spaced-apart so that the arc is located generally in the center of the reaction chamber. The interior of the reaction chamber is generally spherical in shape and is light reflective, so as to prevent dissipation of light energy. Optionally, the reaction chamber is pressurized to further enhance the efficiency of the reaction.

REFERENCES:
patent: 5159900 (1992-11-01), Dammann
patent: 5417817 (1995-05-01), Dammann et al.

Affiliated with

Also associated with

Rating

Reactor configuration for a liquid gasification process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Reactor configuration for a liquid gasification process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Reactor configuration for a liquid gasification process will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2209023