Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-06-10
1993-02-23
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430192, 430193, G03F 7023, G03C 161
Patent
active
051889200
ABSTRACT:
A positive resist composition comprising a radiation-sensitive component and an alkali-soluble resin and a phenol compound of the formula: ##STR1## wherein R is a hydrogen atom, a lower alkyl group or a phenyl group, R' is an alkyl group or an alkoxy group, and n is a number of 0 to 3, which has well balanced good properties such as sensitivity, resolution, heat resistance and adhesiveness.
REFERENCES:
patent: 4059449 (1977-11-01), Rosenkranz et al.
patent: 4594306 (1986-06-01), Stahlhofen et al.
patent: 4891311 (1990-01-01), Uenishi et al.
patent: 5112719 (1992-05-01), Yamada et al.
Patent Abstracts of Japan, vol. 14, No. 672 (P-1004) (4015) Feb. 9, 1990, JP-A-1 289 946 (Sumitomo Chem Co Ltd) Nov. 21, 1989, abstract only.
Hioki Takeshi
Moriuma Hiroshi
Osaki Haruyoshi
Uetani Yasunori
Bowers Jr. Charles L.
Sumitomo Chemical Company Limited
Young Christopher G.
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