Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1996-12-16
1998-06-09
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
25049223, 250423F, H01J 3730
Patent
active
057638934
ABSTRACT:
Electron guns particularly suitable for electron-beam projection microlithography are disclosed. The electron guns produce an electron beam having a uniform intensity distribution over a wide field, and that permit electron-beam brightness to be varied over a wide range. The electron gun comprises a cathode including a planar circular emission surface. Arranged in sequence along an optical axis from the cathode are a Wehnelt (focusing electrode), an anode, and a ground electrode. The Wehnelt includes a conical upper surface exhibiting a half-angle .theta.1 relative to the axis of 67.5.degree.. The anode includes a conical surface axially facing the cathode, the conical surface being concave with respect to the cathode. The anode also includes a conical surface axially facing the ground electrode, the conical surface being concave with respect to the ground electrode. The anode can be energized with a variable electric potential 0.1-10 kV higher than the potential of the cathode. The ground electrode comprises a conical surface axially facing the anode, the conical surface being convex with respect to the anode. Also disclosed are electron-beam projection-lithography apparatus comprising such electron guns.
REFERENCES:
patent: 4731537 (1988-03-01), Williams et al.
patent: 5041732 (1991-08-01), Saito et al.
patent: 5616926 (1997-04-01), Shinada et al.
patent: 5633507 (1997-05-01), Pfeiffer et al.
DeVore et al., "High Emmittance Electron Gun for Projection Lithography," The 40th Int'l Conf. on Electron, Ion and Photon Beam Technology and Nanofabrication, Atlanta, Georgia, May 28-31, 1996 (abstract only).
Nagami, Electro-Ion Beam Handbook, pp. 42-49, Nikkann-Kogyo Shinnbunnsya, Chiyoda-ku, Tokyo, Japan (1973). (English translation attached).
Nguyen Kiet T.
Nikon Corporation
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