Downstream plasma using oxygen gas mixture

Details Downstream plasma using oxygen gas mixture Downstream plasma using oxygen gas mixture

1998-02-17

2000-09-05

Nuzzolillo, Maria

Coating apparatus

Gas or vapor deposition

With treating means

118723ER, 216 68, 438711, 438714, 438729, 427562, C23C 1600, B44C 122, B05D 314

Patent

active

061126969

ABSTRACT:
A constriction in the exhaust side of a discharge chamber containing oxygen isolates the oxygen supply from the rest of the system. A constriction of equal size or larger is used in the supply of another gas, thereby enabling mixtures of oxygen and other gases to be used in a downstream plasma system. In one embodiment of the invention, the gases are dissociated separately and then combined in a mixing chamber. In another embodiment, oxygen is dissociated and then a lighter gas is added and the mixture is dissociated. In a preferred embodiment of the invention, the lighter gas is selected from the group consisting of water vapor and nitrogen.

REFERENCES:
patent: 4664747 (1987-05-01), Sakiguchi et al.
patent: 5018479 (1991-05-01), Markunas et al.
patent: 5180435 (1993-01-01), Markunas et al.
patent: 5226056 (1993-07-01), Kikuchi et al.
patent: 5620523 (1997-04-01), Maeda et al.
patent: 5641359 (1997-06-01), Yavelberg
patent: 5753320 (1998-05-01), Mikoshiba et al.
patent: 5904952 (1999-05-01), Lopata et al.

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