Plasma processing apparatus

Details Plasma processing apparatus Plasma processing apparatus

1994-12-07

1997-03-25

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

118723MW, 118723ME, 118723E, C23C 1600

Patent

active

056140258

ABSTRACT:
A plasma processing apparatus for processing wafers or similar objects with neutral particles produced from plasma. A microwave is introduced into the apparatus via a dielectric path, or waveguide, having a broad radiation area. The microwave, therefore, generates uniform and dense plasma over a broad area. Neutral particles are produced from the plasma by two electrodes. As a result, an object is processed at a high speed by a beam of uniformly distributed neutral particles.

REFERENCES:
patent: 4985109 (1991-01-01), Otsubo
patent: 5017404 (1991-05-01), Paquet
patent: 5134965 (1992-08-01), Tokuda
patent: 5284544 (1994-02-01), Mizutani
patent: 5304250 (1994-04-01), Sameshima
patent: 5364519 (1994-11-01), Fujimura
patent: 5439715 (1995-08-01), Okamura

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