Patent
1992-12-17
1994-08-09
Rutledge, D.
G03D 302
Patent
active
053371143
ABSTRACT:
A method and an apparatus for adding water to a photosensitive material processor for adding an amount of water corresponding to an amount of evaporation of a processing solution stored in a processing tank of the photosensitive material processor, to the processing tank, so as to keep the concentration of the processing solution constant. Relationships between an ambient condition which is determined by one of an ambient temperature and relative humidity of the photosensitive material processor, an ambient vapor pressure, and an ambient absolute humidity on the one hand, and the amount of evaporation of the processing solution on the other, are determined in advance. The ambient condition is detected, and the amount of water to be added to the processing tank is determined on the basis of the ambient condition detected and the relationships determined, so as to supply the determined amount of water to the processing tank.
REFERENCES:
patent: 5177521 (1993-01-01), Mogi et al.
patent: 5185623 (1993-02-01), Mogi
Japanese Patent Abstracts, vol. 91, p. 999 (JPA 1-281446).
Japanese Patent Abstracts, vol. 158, p. 985 (JPA 1-254959).
Japanese Patent Abstracts, vol. 159, p. 985 (JPA 1-254960).
Japanese Patent Abstracts, vol. 132, p. 1335 (JPA 4-1756).
Fuji Photo Film Co. , Ltd.
Rutledge D.
LandOfFree
Method and apparatus for adding water to photosensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for adding water to photosensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for adding water to photosensitive material will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-219789