Method and apparatus for applying sealant material in an insulat

Adhesive bonding and miscellaneous chemical manufacture – Methods – Surface bonding and/or assembly therefor

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156109, 15624422, 156575, C03C 2710

Patent

active

057627380

ABSTRACT:
There is disclosed a method and apparatus for applying sealant material to the void in the perimeter between spaced-apart substrates in an insulated glass assembly. An apparatus includes a traveling applicator head and a stationary head, both applicator heads including a nozzle member and independently movable wiper member which cooperate to apply a smooth and even layer of sealant material. An advantage of the cooperating nozzle and wiper members is the ability to mold corners and to apply sealant material without lifting the applicator from the glass assembly. The method is sequential and employs two cooperating applicator heads, conveyors and position sensors to permit fully or semi-automated operation. The smoothing plates move in concert with the extrusion nozzles to ensure uniform distribution of the sealant material from the spacer, and a uniform and planar surface at the perimeter. The method of operation is automated and accordingly, the sealant can be applied in an expedited manner with a high degree of precision and uniformity.

REFERENCES:
patent: 4826547 (1989-05-01), Lenhardt

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for applying sealant material in an insulat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for applying sealant material in an insulat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for applying sealant material in an insulat will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2194767

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.