Photocopying – Projection printing and copying cameras – Step and repeat
Patent
1992-12-07
1993-09-28
Wintercorn, Richard A.
Photocopying
Projection printing and copying cameras
Step and repeat
G03B 2742
Patent
active
052490165
ABSTRACT:
A semiconductor device manufacturing system includes a resist coating unit for applying a photoresist to a wafer having different shot areas in each of which an alignment mark and a deviation measuring mark are formed and an exposure unit for exposing the photoresist in each shot area of the wafer to an exposure beam passed through a reticle having a deviation measuring mark. The exposure unit includes a detector for detecting, with respect to each shot area, a positional error of the wafer to the reticle by using the alignment mark, a stage for adjusting the positional relationship between the reticle and the wafer on the basis of the detection and an exposure system for exposing the wafer to the exposure beam passed through the reticle, to thereby print the deviation measuring mark of the reticle to the photoresist on each shot area of the wafer. The manufacturing system further includes a developing unit for developing the exposed photoresist, a conveying unit for conveying the developed wafer again into the exposure unit, and a control unit. The control unit causes the detector to detect, with respect to each shot area, a deviation between the deviation measuring mark of the wafer and the deviation measuring mark of the reticle as photoprinted on the photoresist of the wafer. The control unit also calculates a precision of alignment and/or an offset in the alignment between the reticle and the wafer based on the alignment mark.
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Canon Kabushiki Kaisha
Wintercorn Richard A.
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