Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1991-11-14
1993-09-28
Kunemund, Robert
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
156603, 156610, 156614, 156621, 156622, 427596, 505729, 505730, 505732, B05D 306
Patent
active
052486591
ABSTRACT:
In a process for preparing a thin film of a Bi-Sr-Ca-Cu-O based oxide superconductor by a laser ablation method in which a target is irradiated with a pulsed laser beam to grow a thin film on a substrate positioned to face the target, the improvement wherein the pulse rate of the pulsed laser beam is adjusted to 0.01-10 Hz and the application of the laser beam is interrupted at each time a superconducting thin oxide film is grown to a thickness equivalent to one half the unit cell or one unit cell of a Bi-Sr-Ca-Cu-O based oxide superconductor, whereby a thin film of the oxide superconductor is grown at an average growth rate of no more than 0.5 .ANG./sec.
REFERENCES:
patent: 4939308 (1990-07-01), Mayfield et al.
patent: 5015618 (1991-05-01), Levinson
patent: 5055445 (1991-10-01), Belt et al.
Applied Physics Letters, vol. 54, No. 18, May 1, 1989, New York, US, pp. 1802-1804; Kanal, M. et al: "Low-Temperature Formation of Multilayered Bi(Pb)-Sr-Ca-Cu-O Thin Films by Successive Deposition Using Laser Ablation".
Japanese Journal of Applied Physics Letters, vol. 28, No. 5, May 1989, Tokyo, JP, pp. 823-826; Tabata H. et al: "Tailored Thin Films of Superconducting Bi-Sr-Ca-Cu-O Oxide Prepared by Excimer Laser Ablation Technique".
Journal of Applied Physic, vol. 67, No. 6, Mar. 15, 1990, New York, US, pp. 3069-3071; Meskoob M. et al: "CO2-Laser Ablation of Bi-Sr-Ca-Cu Oxide by Millisecond Pulse Lengths".
Applied Physics Letters, vol. 56, No. 16, Apr. 16, 1990, New York, US, pp. 1576-1578; H. Tabata et al: "Tailored Thin Films of a Superconducting Bi-Sr-Ca-Cu Oxide Prepared by Incorporation of Exotic Atoms-Control of the Distance between CuO2 Layers".
Hattori Hisao
Itozaki Hideo
Nagaishi Tatsuoki
Garrett Felisa
Kunemund Robert
Sumitomo Electric Industries Ltd.
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