Photomask

Details Photomask Photomask

1991-03-14

1993-09-28

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, G03F 900

Patent

active

052485749

ABSTRACT:
Disclosed herein is a photomask including: a light-transmitting substrate; a light-shielding layer provided on the substrate; a substantially tetragonal aperture opened in the light-shielding layer; and shifter portions which transmit light and, at the same time, invert the phase of light, the shifter portions being provided along intermediate portions, but not in the vicinity of both end portions, of each edge of the substantially tetragonal aperture, in a predetermined width.

REFERENCES:
patent: 4876164 (1989-10-01), Watakabe et al.
patent: 5039203 (1991-08-01), Nishikawa
patent: 5045417 (1991-09-01), Okamoto

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