Method of removing coating films

Cleaning and liquid contact with solids – Processes – Including melting

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134 6, 134 7, 134 10, 134 19, 134 38, B08B 308, B08B 310, B08B 700

Patent

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055429823

ABSTRACT:
Improved methods of removing coating films from resin substrates includes first treating the resin substrates in an aqueous alkali solution with a concentration of 0.1 wt % or more at a temperature of 110.degree. C. or more, which temperature is lower than the melting point of the substrates and then polishing the surfaces of the substrates by either bringing them into contact with each other in suitable equipment such as a screw feeder, or using an abrasive in suitable equipment such as a high-speed vessel type stirrer, or subjecting the substrates to a liquid honing process.

REFERENCES:
patent: 2917418 (1959-12-01), Cathcart
patent: 4287689 (1981-09-01), Mindel et al.
patent: 4324705 (1982-04-01), Seto et al.
patent: 4549374 (1985-10-01), Basi et al.
patent: 5055139 (1991-10-01), Personette
patent: 5127958 (1992-07-01), Personette
patent: 5266088 (1993-11-01), Sandusky et al.
patent: 5269820 (1993-12-01), Fujii et al.
patent: 5304252 (1994-04-01), Condra et al.
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