Method of making an integrated circuit with complementary isolat

Fishing – trapping – and vermin destroying

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437 55, 437 77, 437 74, H01L 21265

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055299393

ABSTRACT:
Process for making an integrated-circuit (IC) chip with junction-isolated complementary bipolar transistors. In this process an N-well is formed in a P-type substrate. P-type dopant is implanted in the N-well to become a sub-collector for a pnp transistor. N-type dopant is implanted in the substrate in a location laterally displaced from the N-well to become a sub-collector for an npn transistor. N-type material is implanted in the N-well to begin the formation of an isolation wall for the pnp transistor. A P-type epitaxial (epi) layer then is grown over the P-type substrate. N-type material is implanted in the epi layer to complete the isolation wall for the pnp transistor, and to complete the collector for the npn transistor. P-type and N-type material also is implanted in the P-type epi layer to form the bases and emitters for the npn and pnp transistors.

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patent: 4910160 (1990-03-01), Jennings et al.
patent: 4939099 (1990-07-01), Seacrist et al.
patent: 4940671 (1990-07-01), Small et al.
patent: 4965215 (1990-10-01), Zambrano et al.
patent: 4969823 (1990-11-01), Lapham et al.

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