Apparatus for manufacturing a liquid crystal display substrate,

Details Apparatus for manufacturing a liquid crystal display substrate, Apparatus for manufacturing a liquid crystal display substrate,

1995-02-09

1996-06-25

Snay, Jeffrey R.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Condition of coated material

118620, 437174, 148DIG6, 148DIG90, 422108, 2503541, 25049223, H01L 2126

Patent

active

055296300

ABSTRACT:
An amorphous silicon film is formed on a glass substrate by a CVD method, and then the island regions of the amorphous silicon film is changed to a plurality of polycrystalline silicon regions which are arranged in a line and apart with each other in a predetermined distanced by intermittently irradiating laser pulses each having the same dimensions as those of the island region onto the amorphous silicon film, using a laser beam irradiating section. Switching elements including the island regions as semiconductor regions are formed by etching and film-forming process to constitute a driving circuit section. The section is divided to gate driving circuit sections and source driving circuit sections for driving thin film transistors formed in a pixel region.

REFERENCES:
patent: 4292091 (1981-09-01), Togei
patent: 4309225 (1982-01-01), Fan et al.
patent: 4322253 (1982-03-01), Pankove et al.
patent: 4724219 (1988-02-01), Ridinger
patent: 4931132 (1990-06-01), Aspnes et al.

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