Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1994-02-16
1995-08-15
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7023
Patent
active
054418453
ABSTRACT:
A photosensitive resin composition which is adapted for protecting articles and particularly, electronic parts, therewith comprises a polyimide precursor of the following general formula ##STR1## wherein each X individually represents a tetravalent organic group, each Y individually represents a divalent organic group, R.sup.1, R.sup.2 and R.sup.3 may be the same or different and represent a hydrogen atom or a monovalent organic group having form 1 to 10 carbon atoms, and p, q and m are, respectively, an integer of 1 or over, and a photosensitive diazoquinone compound.
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"New High Temperature Stable Positive Photoresists Based On Hydroxy Polyimides And Polyamides Containing The Hexafluoroisopropylidene (6-F) Linking Group" By D. N. Khanna et al; Polymer Engineering and Science, Jul. 1989, vol. 29, No. 14, pp., 954-959.
Kato Hideto
Okinoshima Hiroshige
Bowers Jr. Charles L.
Shin-Etsu Chemical Co. , Ltd.
Young Christopher G.
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