Processing apparatus using gas

Details Processing apparatus using gas Processing apparatus using gas

1994-04-04

1995-08-15

Nilson, Robert G.

Fluid handling

Line condition change responsive valves

Pilot or servo controlled

1374875, 137884, G05D 706

Patent

active

054410762

ABSTRACT:
A vertical heat treatment apparatus includes a heat treatment unit for performing a heat treatment process to a semiconductor wafer using a gas and a gas supply unit for supplying the gas to the heat treatment unit. The gas supply unit includes a plurality of gas controlling instruments having a plurality of gas flow control devices, a gas controlling instruments-storage vessel for storing the instruments, and a plurality of electrical parts arranged outside the storage vessel and belonging to the instruments, and an electrical parts-storage vessel for storing the electrical parts, and the plurality of gas flow control devices are integrated with each other by block-like joints.

REFERENCES:
patent: 3726296 (1973-04-01), Friedland
patent: 4356840 (1982-11-01), Friedland
patent: 4687020 (1987-08-01), Doyle
patent: 5062446 (1991-11-01), Anderson

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