Photodefinable polymers containing perfluorocyclobutane groups

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Compositions to be polymerized by wave energy wherein said...

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522152, 522153, 522154, 522156, 427508, 427510, 427520, C08F 248

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active

054896231

ABSTRACT:
A polymer has at least one photoactive site and more than one perfluorocyclobutane group. New monomers containing photoactive sites or photoactive precursors and at least one perfluorovinyl group are useful for making such polymers. Processes of making such polymers and the monomers from which they are made are disclosed. The polymers are useful in coatings, photoresists, and the like.

REFERENCES:
patent: 3453237 (1969-07-01), Borden et al.
patent: 3647444 (1972-03-01), Borden et al.
patent: 5021602 (1991-06-01), Clement et al.
patent: 5023380 (1991-06-01), Babb et al.
patent: 5037917 (1991-08-01), Babb et al.
patent: 5037918 (1991-08-01), Babb
patent: 5037919 (1991-08-01), Clement et al.
patent: 5066746 (1991-11-01), Clement et al.
patent: 5084538 (1992-01-01), Suzuki et al.
patent: 5159036 (1992-10-01), Babb
patent: 5159037 (1992-10-01), Clement et al.
patent: 5159038 (1992-10-01), Babb et al.
patent: 5162468 (1992-11-01), Babb et al.
Chemical Abstract 103: 45821e, 1985.
Chemical Abstract 96: 218715r, 1982.
Chemical Abstract 92: 199109v, 1980.
Chemical Abstract 91: 124401e, 1979.
Chemical Abstract 89: 138345k, 1978.
Chemical Abstract 88: 191835a, 1978.
Chemical Abstract 111: 173458u, 1989.
Chemical Abstract 106: 58785h, 1987.
Chemical Abstract 86: 113723g, 1977.
Chemical Abstract 70: 20691z, 1969.
Douglas G. Borden, ACS Div. Org. Coat. Plast. Chem. Pap., vol. 35, pp. 96-101, (1975), "Changes in Photosensitivity".
Journal of Polymer Science: Part A, vol. 2, pp. 2907-2916, 1964, "Some Aspects of the Photosensitivity of Poly(vinyl Cinnamate)."
C. G. Roffey, Photopolymerization of Surface Coatings, (1982), pp. 26-27, 67-68, 141-161, 276-283, 290-296.
H. J. Merrem et al, Polyimides, vol. 2, pp. 919-931, (1984) "New Developments in Photosensitive". Polyimides.
O. Rohde, Advances in Resist Technology and Processing II, vol. 539, pp. 175-179, (1985), "Recent Advances in Photoimagable Polyimides".
Journal of Polymer Science: Part A-1, vol. 8, pp. 1939-1948, (1970), "Photocycloaddition Polymerization I. Preparation and Characterization of Poly-N,N'-polymethylenebisdichloromaleimides*".
Journal of Polymer Science: Part A-1, vol. 8, pp. 1022-1023, (1970), "Photosensitization of Polyacetylenes".
EM Industries, Inc., Merck Electronic Chemicals, "Photoresists", pp. 1-31.
L. F. Thompson et al., ACS Symposium Series 219, pp. 43-46, 90-92, 107-159, (1983) "Introduction to Microlithography".
Elsa Reichmanis et al, ACS Symposium Series 412, pp. 1-24, (1989), "Polymers in Microlithography".
Derwent Abstract 84-196843/32.

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