Photosensitive member having an amorphous silicon layer

Details Photosensitive member having an amorphous silicon layer Photosensitive member having an amorphous silicon layer

Filed on

1986-07-16

Date issued

1988-04-19

Examiner

Shah, Mukund J.

Patent Class

Radiation imagery chemistry: process, composition, or product th

SubClass

Electric or magnetic imagery, e.g., xerography,...

SubSubClass

Radiation-sensitive composition or product

Other Related Categories

430 57, 430 60, 430 63, 430 65, 430 66, 430 67, 430 85, 430 95, G03G 1502, G03G 1504, G03G 1508, G03G 508

Type

Patent

Status

active

Patent number

047389141

Description

ABSTRACT:
The invention disclosed relates to a photosensitive member with an amorphous silicon photoconductive layer. On the photoconductive layer, an insulating layer including amorphous silicon, carbon and oxygen is formed. The amount of carbon is 5 to 65 atomic % and less than 10 atomic % for oxygen if both carbon and oxygen are included uniformly throughout the layer. An amorphous silicon barrier layer containing either oxygen and boron or oxygen and carbon may be formed between the substrate and the photoconductive layer.

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patent: 4491626 (1985-01-01), Kawamura et al.
patent: 4501807 (1985-02-01), Shirai et al.

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