Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Two or more radiation-sensitive layers containing other than...
Patent
1994-12-06
1996-02-06
Neville, Thomas R.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Two or more radiation-sensitive layers containing other than...
430512, 544116, 544113, 544216, G03C 146
Patent
active
054895030
ABSTRACT:
Novel UV absorbers of the bis- or tris-2'-hydroxyphenyltriazine type and their use in photographic materials, inks or recording materials for ink-jet printing, and surface coatings are described which conform to the formula ##STR1## in which the radicals R.sub.1 and R.sub.9 are as defined in claim 1.
REFERENCES:
patent: 3118887 (1964-01-01), Hardy et al.
patent: 3244708 (1966-04-01), Duennenberger et al.
patent: 3843371 (1974-10-01), Piller et al.
patent: 4518686 (1985-05-01), Sasaki et al.
patent: 4826978 (1989-05-01), Migdal et al.
patent: 4853471 (1989-08-01), Rody et al.
patent: 4921966 (1990-05-01), Stegmann et al.
patent: 4973701 (1990-11-01), Winter et al.
patent: 4973702 (1990-11-01), Rody et al.
patent: 5096781 (1992-03-01), Vieira et al.
patent: 5106891 (1992-04-01), Valet
patent: 5300414 (1994-04-01), Leppard et al.
patent: 5364749 (1994-11-01), Leppard et al.
C.A. Registry No. 1440-02-4.
C.A. Registry No. 1908-78-7.
C.A. Registry No. 4517-07-1.
CA Registry No. 148236-67-3 (Dec. 1992).
CA Registry No. 148236-68-4 (Mar. 1993).
CA Registry No. 148236-58-2 (Mar. 1993).
Ciba-Geigy Corp.
Kovaleski Michele A.
Neville Thomas R.
LandOfFree
UV absorbers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with UV absorbers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and UV absorbers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2174457