Low residue aqueous hard surface cleaning and disinfecting compo

Details Low residue aqueous hard surface cleaning and disinfecting compo Low residue aqueous hard surface cleaning and disinfecting compo

1999-07-09

2000-12-12

Gupta, Yogendra

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

With halogen, nitrogen, oxygen, or phosphorus containing...

510182, 510199, 510237, 510238, 510245, 510362, 510365, 510382, 510384, 510391, 510432, 510470, 510503, 510504, C11D 162, C11D 344, C11D 175, C11D 322

Patent

active

061599247

ABSTRACT:
Aqueous based cleaning compositions simultaneously featuring disinfecting, low residue deposit and good cleaning characteristics are provided. The compositions include one or more quaternary amine compounds as disinfecting active agents, an organic solvent system, one or more amine oxides, one or more nonionic alkylpolyglycosides, water and optionally further conventional additives including pH buffers, dyes, fragrances and the like.

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PCT International Search Report for PCT/GB99/02212 dated Oct. 28, 1999.

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