Patent
1975-10-10
1977-09-06
Hix, L. T.
354 32, 354 59, G03B 714
Patent
active
040471900
ABSTRACT:
An exposure control system for photographic apparatus having a shutter-diaphragm mechanism for regulating the exposure aperture and the exposure interval under both ambient and flash illumination conditions. The shutter-diaphragm includes a blade arrangement which when driven in an opening direction provides enlarging aperture values in a tracking relation defining both a taking aperture and a photocell aperture until both achieve a maximum at which time further blade displacement provides a reduction in the photocell aperture to accommodate ambient, low scene light conditions. Under flash conditions, the system employs hybrid operation in which the exposure aperture is selected by a follow-focus mechanism in accordance with subject distance while the interval is determined by the scene light transmitted to the photocell. For large subject distances, the range of the follow-focus mechanism is restricted so as to limit the blade displacement to that at which both aperture values substantially achieve their maximum values.
REFERENCES:
patent: 3896458 (1975-07-01), Johnson et al.
Johnson Bruce K.
Whiteside George D.
Hix L. T,.
LaBarre J. A.
Polaroid Corporation
Thornton David R.
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