IC analysis system having charged particle beam apparatus for im

Details IC analysis system having charged particle beam apparatus for im IC analysis system having charged particle beam apparatus for im

1994-09-21

1997-06-17

Teska, Kevin J.

Radiant energy

Ionic separation or analysis

Static field-type ion path-bending selecting means

250310, 2504922, 25049222, 371 226, 371 27, 382144, 382145, G06F 1700, H01J 37304, G21K 108

Patent

active

056405391

ABSTRACT:
The object of the invention is to provide an IC analysis system having a charged particle beam apparatus in which the operability and picture quality have been enhanced and the measurement method of a device under test. In the IC analysis system, stop signal generating means in which the stop signal stimulates the acquisition of image data is added to a test pattern generator and acquisition completion signal generating means which releases the stopping state on completing the acquisition of image data and which resumes the test pattern updating operation is added to the charged particle beam apparatus. Furthermore, by adding mode select means to the charged particle beam apparatus, a clearer potential contrast image can be obtained. The methods for locating fault positions can be realized in the IC analysis system having the charged particle beam apparatus wherein the image data can be obtained by alternate test patterns, or by adding one image data to the reverse potential of another image data, or by scanning and irradiating the charged particle beam onto the same surface of the device at a plurality of times.

REFERENCES:
patent: 4807159 (1989-02-01), Komatsu et al.
patent: 4996434 (1991-02-01), Tanaka
patent: 5004927 (1991-04-01), Nakagawa
patent: 5144225 (1992-09-01), Talbot et al.
patent: 5146089 (1992-09-01), Rosien
patent: 5210696 (1993-05-01), Yano
patent: 5287290 (1994-02-01), Tabara et al.
patent: 5369282 (1994-11-01), Arai et al.
patent: 5376883 (1994-12-01), Kaito
patent: 5393976 (1995-02-01), Koike
patent: 5481550 (1996-01-01), Garcia et al.

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