1986-11-19
1988-10-04
Carroll, J.
357 4, 357 16, 357 34, 357 55, 357 56, 357 60, H01L 2972, H01L 29161, H01L 2712
Patent
active
047758821
ABSTRACT:
Silicon doping of GaAs provides n conductivity in {100} planes and p conductivity in {111} A planes. A split level of Si-doped GaAs utilizes this phenomena to provide a bipolar transistor. In one embodiment, the emitter is one level of the layer in the {100} planes, and the collector is another level of the layer in the {100} planes. These n conductivity levels are joined by {111} A planes to form a p conductivity base. The junctions in the layer between the {100} planes and the {111} A planes form an npn transistor.
REFERENCES:
patent: 4137543 (1979-01-01), Beneking
patent: 4677456 (1987-06-01), Feist
IBM Technical Disclosure Bulletin, "Metal-InAS Contact for Vertical Heterojunction Transistors", vol. 29, No. 5, Oct. 1986.
Asbeck Peter M.
Miller David L.
Carroll J.
Hamann H. Fredrick
Malin Craig O.
Ngo Ngan Van
Rockwell International Corporation
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