Lateral bipolar transistor

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357 4, 357 16, 357 34, 357 55, 357 56, 357 60, H01L 2972, H01L 29161, H01L 2712

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047758821

ABSTRACT:
Silicon doping of GaAs provides n conductivity in {100} planes and p conductivity in {111} A planes. A split level of Si-doped GaAs utilizes this phenomena to provide a bipolar transistor. In one embodiment, the emitter is one level of the layer in the {100} planes, and the collector is another level of the layer in the {100} planes. These n conductivity levels are joined by {111} A planes to form a p conductivity base. The junctions in the layer between the {100} planes and the {111} A planes form an npn transistor.

REFERENCES:
patent: 4137543 (1979-01-01), Beneking
patent: 4677456 (1987-06-01), Feist
IBM Technical Disclosure Bulletin, "Metal-InAS Contact for Vertical Heterojunction Transistors", vol. 29, No. 5, Oct. 1986.

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