Treating workpieces with beams

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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Details

250397, G01N 2300, A61K 2702

Patent

active

047757965

ABSTRACT:
A dose monitoring system for ion implantation devices which employ a moving support element such as a spinning support disk which is moved through an ion beam by a scan motion uses a pick-up plate on the spinning support disk to measure incremental dose and to generate a signal which is used to vary the scan motion of the spinning support disk in order to control dosage.

REFERENCES:
patent: 3778626 (1973-12-01), Robertson
patent: 4021675 (1977-05-01), Shifrin
patent: 4517465 (1985-05-01), Gault

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