Positive photoresist composition containing alkali soluble resin

Details Positive photoresist composition containing alkali soluble resin Positive photoresist composition containing alkali soluble resin

1996-03-14

1997-06-17

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430191, 430192, 430193, G03F 7023

Patent

active

056395876

ABSTRACT:
A positive photoresist composition is disclosed, which comprises an alkali-soluble resin, at least one of 1,2-naphthoquinonediazidesulfonic monoesters of specific polyhydroxy compounds, and at least one of 1,2-naphthoquinonediazidesulfonic ester of specific polyhydroxy compounds. The positive photoresist composition exhibits remarkably improved sensitivity and resolution, and broad development latitude regardless of the film thickness, and further, low film thickness dependence of resist performances.

REFERENCES:
patent: 5407778 (1995-04-01), Uetani et al.
patent: 5529881 (1996-06-01), Kawabe et al.

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