Heat-developable light-sensitive material

Details Heat-developable light-sensitive material Heat-developable light-sensitive material

1986-03-31

1988-10-04

Louie, Won H.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Two or more radiation-sensitive layers containing other than...

430619, 430620, 430543, 430559, 430562, 430203, 430351, 430353, G03C 106, G03C 726, G03C 732

Patent

active

047756136

ABSTRACT:
A heat-developable light-sensitive material comprising a support having thereon at least one layer containing a light-sensitive silver halide, a reducing agent, a binder and an acetylene silver compound.
The heat-developable light-sensitive material which contains the novel organic silver compound can provide images having high density and low fog when subjected to a short period of developing time even when a small amount of a base processor is used.

REFERENCES:
patent: 4535056 (1985-08-01), Frenchik
patent: 4584267 (1986-04-01), Masukawa et al.
patent: 4603103 (1986-07-01), Hirai et al.
patent: 4610957 (1986-09-01), Kato et al.
patent: 4629684 (1986-12-01), Sato et al.

Affiliated with

Also associated with

Rating

Heat-developable light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heat-developable light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heat-developable light-sensitive material will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2156040