Process for forming deposition film

Details Process for forming deposition film Process for forming deposition film

1988-02-22

1989-05-30

Childs, Sadie

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 42, 427 58, 427255, 4272551, 4272552, 427225, B05D 306, C23C 1600

Patent

active

048350052

ABSTRACT:
A process for forming a deposition film on a substrate comprises introducing separately a precursor or activated species formed in a decomposition space (B) and activated species formed in a decomposition space (C), into the deposition space wherein the film is formed on the substrate.

REFERENCES:
patent: 3473978 (1969-10-01), Jackson et al.
patent: 3825439 (1974-07-01), Tick
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4077818 (1978-03-01), Chu
patent: 4084024 (1978-04-01), Schumacher
patent: 4217374 (1980-08-01), Ovshinsky et al.
patent: 4220488 (1980-09-01), Duchemin et al.
patent: 4282267 (1981-08-01), Kuyel
patent: 4363828 (1982-12-01), Brodsky et al.
patent: 4402762 (1983-09-01), John et al.
patent: 4410559 (1983-10-01), Hamakawa et al.
patent: 4419381 (1983-12-01), Yamazaki
patent: 4430185 (1984-02-01), Shimomoto et al.
patent: 4434188 (1984-02-01), Kamo et al.
patent: 4439463 (1984-03-01), Miller
patent: 4441973 (1984-04-01), Noguchi
patent: 4448801 (1984-05-01), Fukuda et al.
patent: 4450185 (1984-05-01), Shimizu et al.
patent: 4461783 (1984-07-01), Yamazaki
patent: 4466992 (1984-08-01), Dreiling
patent: 4468413 (1984-08-01), Bachmann
patent: 4468443 (1984-08-01), Shimizu et al.
patent: 4471042 (1984-09-01), Komatsu et al.
patent: 4485125 (1984-11-01), Izu et al.
patent: 4504518 (1985-03-01), Ovshinsky et al.
patent: 4514437 (1985-04-01), Nath
patent: 4517223 (1985-05-01), Ovshinsky et al.
patent: 4521447 (1985-06-01), Ovshinsky et al.
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4526805 (1985-07-01), Yoshizawa
patent: 4532199 (1985-07-01), Ueno et al.
patent: 4543267 (1985-09-01), Yamazaki
patent: 4544423 (1985-10-01), Tsuge et al.
patent: 4546008 (1985-10-01), Saitoh et al.
patent: 4554180 (1985-11-01), Hirooka
patent: 4564533 (1986-01-01), Yamazaki
patent: 4564997 (1986-01-01), Matsuo et al.
patent: 4569697 (1986-02-01), Tsu et al.
patent: 4582560 (1986-04-01), Sanjurjo
patent: 4615905 (1986-10-01), Ovshinsky
patent: 4664937 (1987-05-01), Ovshinsky et al.
patent: 4702934 (1987-10-01), Ishihara et al.
Brodsky et al., 22 IBM Technical Disclosure Bulletin 3391 (Jan. 1980).
Janai et al., 52 J. Appl. Phys. 3622 (May 1981).

Affiliated with

Also associated with

Rating

Process for forming deposition film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for forming deposition film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for forming deposition film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2151429