Two-phase optical inspection method and apparatus for defect det

Details Two-phase optical inspection method and apparatus for defect det Two-phase optical inspection method and apparatus for defect det

1991-11-12

1997-12-16

Johns, Andrew

Image analysis

Applications

Manufacturing or product inspection

382318, 348126, G06K 900

Patent

active

056994478

ABSTRACT:
A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected by scanning its complete surface at a relatively high speed and with an optical beam of relatively small diameter, particularly a laser beam, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.

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