Photosensitive compositions and lithographic printing plates con

Details Photosensitive compositions and lithographic printing plates con Photosensitive compositions and lithographic printing plates con

1991-07-30

1993-11-16

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430157, 430175, 430176, 430278, 430286, 430302, 430908, 430909, 525 61, G03F 7021, G03C 154, G03C 177

Patent

active

052622703

ABSTRACT:
Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and a binary acetal polymer which functions as a polymeric binder. The binary acetal polymers are comprised of recurring units which include two six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group and the other of which is substituted with an aromatic or heterocyclic moiety.

REFERENCES:
patent: 3847614 (1974-11-01), Mattor
patent: 4413091 (1983-11-01), Iwasaki et al.
patent: 4588669 (1986-05-01), Asano
patent: 4652604 (1987-03-01), Walls et al.
patent: 4741985 (1988-05-01), Aoai et al.
patent: 4940646 (1990-07-01), Pawlowski

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