Exposure apparatus and methods

Photocopying – Projection printing and copying cameras – Step and repeat

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Details

356400, 356401, G01B 1100, G03B 2742

Patent

active

059780690

ABSTRACT:
Exposure apparatus are disclosed that are particularly adapted for exposing relatively large patterns on a photosensitive substrate. The apparatus include an optical illumination system for illuminating a reticle supported by a reticle stage, an optical projection system for projecting an image of a pattern on the reticle to a photosensitive substrate supported on a plate stage, a reference mark on the plate stage, a fixed mark between the position at which the reticle is loaded and the optical projection system, and three position detecting systems. A first position detecting system detects the position of a substrate on the plate stage and/or the position of the reference mark; a second position detecting system detects the relative position of the reference mark and a reticle on the reticle stage; and the third position detecting system detects the relative position of the reference mark and the fixed mark. Applying the third system, the reference mark is used, together with a plate stage interferometer system, to check the relative position of the fixed mark, using an optical path through the optical projection system. Any deviation in the measured position of the fixed mark is corrected, as drift of the reference mark. The correction is then applied to the use of at least one of the first and second systems.

REFERENCES:
patent: 4814830 (1989-03-01), Isohata et al.
patent: 4943733 (1990-07-01), Mori et al.
patent: 5486896 (1996-01-01), Hazama et al.
patent: 5734478 (1998-03-01), Magome et al.
patent: 5844247 (1998-12-01), Nishi

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