Method of fabricating field oxide isolation for a contactless fl

Fishing – trapping – and vermin destroying

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437 43, 437 48, H01L 2170

Patent

active

053710304

ABSTRACT:
A method of forming a contactless EPROM cell inlcudes an initial step of forming an N+ source line in a silicon substrate. First and second N+ drain lines are then formed in parallel with and spaced-apart from the source line on opposite sides of the source line. First and second field oxide strips are formed in parallel with, but spaced-apart from the first and second drain lines, respectively, such that the source line/drain line structure is bounded on both sides by the first and second field oxide strips to separate the structure from adjacent source/drain line structures. First and second poly 1 lines overly the channel regions between the first drain line and the source line and the second drain line and the source line respectively, and are separated therefrom by a first layer of dielectric material. A plurality of spaced-apart, parallel poly 2 word lines overly and run perpendicular to the first and second poly 1 lines and are spaced-apart therefrom by a second dielectric material. Thus, the method results in an EPROM array having cells that are defined at each crossing of the poly 1 lines and the poly 2 word lines.

REFERENCES:
patent: 5081056 (1992-01-01), Mazzali et al.
patent: 5100819 (1992-03-01), Gill et al.

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