Method for forming a light shielding pattern

Details Method for forming a light shielding pattern Method for forming a light shielding pattern

1992-12-17

1995-05-23

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

430 20, 430321, 430325, 359 67, 359 68, G03F 900

Patent

active

054180945

ABSTRACT:
A method for forming a light shielding pattern on a substrate having a picture element pattern on its front including picture elements which have a single color or plural colors and do not contact each other includes.
(1) forming a photopolymerizable light shielding material layer on the front of a substrate having picture element pattern including picture elements having a single color or plural colors,
(2) overall exposing from the back of the substrate,
(3) exposing the photopolymerizable light shielding material layer through a mask which is light transmissive at portions corresponding to the periphery of the picture elements of the picture element pattern formed on the substrate and at portions at which no picture element is present,
(4) developing the photopolymerizable light shielding material to form the light shielding pattern, and
(5) subjecting the light shielding pattern formed to a side etching to remove any portion of the light shielding pattern, which overlaps with the picture elements wherein step (2) is carried out after step (1) and before step (5).

REFERENCES:
patent: 4837097 (1989-06-01), Narang et al.

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