Fractionated novolak resin and photoresist composition therefrom

Details Fractionated novolak resin and photoresist composition therefrom Fractionated novolak resin and photoresist composition therefrom

1998-08-04

1999-11-02

Truong, Duc

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From phenol, phenol ether, or inorganic phenolate

528137, 528480, 528490, 528491, 528502R, 4302701, 430311, 430326, C08G 804, C08G 1804

Patent

active

059772883

ABSTRACT:
The present invention provides a method for producing a film forming, fractionated novolak resin having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin fractions without high temperature distillation. A method is also provided for producing photoresist composition from such a fractionated novolak resin and for producing semiconductor devices using such a photoresist composition.

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Gozdz, A. S. et al. "tert-butoxycarbonylated novolacs as chemically amplified dual-tone resists", Polymer 1992, 33 (21), 4653-4655.
Alger, M.S., Polymer Science Dictionary, 1990, Elsevier, New York, NY, pp. 172-173.

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