Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1989-06-29
1990-05-22
Howell, Janice A.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
H01J 37317
Patent
active
049280180
ABSTRACT:
An electron image projector (10) is exposed to a heat source (22) to induce the emission of electrons (20) which flow from a pattern (14) of a mask (12) to a photoresist layer (18) of a substrate (16). An electron field (26) is applied across the substrate (16) and the mask (12) to accelerate the electrons (20) from the pattern (14) to the photoresist layer (18) to form a shape (24) on the photoresist layer (18) which reproduces the shape of the pattern (14). A projection system (28) can be disposed between the substrate (16) and the mask (12) to selectively direct the plurality of electrons (20) from the pattern (14) to the photoresist layer (18).
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Anderson Rodney M.
Howell Janice A.
Nguyen Kiet-T.
Sharp Melvin
Sorensen Douglas A.
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