Projectin exposure apparatus

Details Projectin exposure apparatus Projectin exposure apparatus

1995-06-06

1997-05-06

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 71, 430 5, G03B 2742

Patent

active

056276265

ABSTRACT:
A projection exposure apparatus is constituted by a first focusing optical system for focusing light from a mercury-vapor lamp as a light source, a uniforming optical system for uniforming the focused light, a second focusing optical system for focusing the uniformed light and radiating the light onto a reticle mask, and a projection optical system for projecting the light, transmitted through the reticle, onto a wafer. A special stop is arranged as a secondary source for uniformly illuminating the mask. The special stop serves to set an intensity distribution within the exit plane of the secondary source so that intensities of both peripheral and central portions are larger than an intensity of an intermediate portion. In addition, the apparatus includes a halftone mask which allows an amplitude transmittance T of the translucent film and an amplitude transmittance T0 of the light-transmitting substrate to satisfy 0.01.times.TO<or=T<or=0.30.times.TO. The phase difference between light passing through the light-transmitting substrate is represented by 180.times.(2n+1)+or -30 (degree) (where n is an integer).

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