Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – From carboxylic acid or derivative thereof
Patent
1989-05-30
1990-05-22
Anderson, Harold D.
Synthetic resins or natural rubbers -- part of the class 520 ser
Synthetic resins
From carboxylic acid or derivative thereof
4284111, 4284735, 528170, 528321, C08G 7312
Patent
active
049279076
ABSTRACT:
A composition is disclosed comprising a bisbenzocyclobutene, a bismide and a free radical inhibitor. The free radical inhibitor is preferably phenothiazine. The presence of the free radical inhibitor enhances the toughness and high-temperature viscosity stability of bisbenzocyclobutene/bismaleimide copolymers.
REFERENCES:
patent: 4160859 (1979-07-01), Renner et al.
patent: 4288583 (1981-09-01), Zahir et al.
patent: 4463147 (1984-07-01), Diethelm et al.
patent: 4465882 (1984-08-01), Miller et al.
patent: 4518755 (1985-05-01), Locatelli et al.
patent: 4525572 (1985-06-01), Diethelm et al.
patent: 4533727 (1985-08-01), Gaku et al.
patent: 4540763 (1985-09-01), Kirchoff
patent: 4642329 (1987-02-01), Kirchoff et al.
patent: 4665881 (1984-08-01), Miller et al.
patent: 4707533 (1987-11-01), Hefner
patent: 4711964 (1987-12-01), Tan et al.
patent: 4730030 (1988-03-01), Hahn et al.
Tan et al., "High-Temperature Thermosetting Resin . . . ," Polymer Preprints 27, pp. 453-454, (1986).
Tan et al., "Melt Polymerization . . . ," Polymer Preprints 28, pp. 650-655, (1987).
Tan et al., "Benzocyclobutene in Polymer Synthesis III . . . ," J. of Polymer Sci., 26, pp. 3103-3117, (1988).
Anderson Harold D.
Shell Oil Company
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