Methods and test structures for measuring overlay in multilayer

Details Methods and test structures for measuring overlay in multilayer Methods and test structures for measuring overlay in multilayer

1996-07-08

1997-12-16

Voeltz, Emanuel T.

Boots, shoes, and leggings

364559, 324699, 324715, 324716, 324765, 437 8, 430 22, 430 30, G01B 1127, G01D 1800

Patent

active

056992823

ABSTRACT:
Imaging instruments for inspecting products, such as semiconductor chips, e calibrated by providing a reference test structure having features which can be located by electrical measurements not subject to tool-induced shift and wafer-induced shift experienced by the imaging instrument, and by the imaging instrument. The reference test structure is first qualified using electrical measurements, and is then used to calibrate the imaging instrument. The electrical measurements are made by forcing a current between a plurality of spaced reference features and a pair of underlying conductors. Conductive connectors formed in vias in an insulating layer overlying the pair of conductors and individually connected to a respective conductive element formed on the insulating layer are each spaced at progressively greater distances relative to the centerline of the space between the pair of conductors, such that a null-overlay element may be identified.

REFERENCES:
patent: 4386459 (1983-06-01), Boulin
patent: 4510446 (1985-04-01), Braun et al.
patent: 4516071 (1985-05-01), Buehler
patent: 4538105 (1985-08-01), Ausschnitt
patent: 4571538 (1986-02-01), Chow
patent: 4672314 (1987-06-01), Kokkas
patent: 4810335 (1989-03-01), Hieber
patent: 4815854 (1989-03-01), Tanaka et al.
patent: 4871962 (1989-10-01), Cheung
patent: 4918377 (1990-04-01), Buehler et al.
patent: 4938600 (1990-07-01), Into
patent: 4983908 (1991-01-01), Tada et al.
patent: 5015323 (1991-05-01), Gallagher
patent: 5044750 (1991-09-01), Shamble
patent: 5051690 (1991-09-01), Maly et al.
patent: 5082792 (1992-01-01), Pasch et al.
patent: 5280437 (1994-01-01), Corliss
patent: 5385289 (1995-01-01), Bloch et al.
patent: 5438413 (1995-08-01), Mazor et al.
patent: 5498500 (1996-03-01), Bae

Affiliated with

Also associated with

Rating

Methods and test structures for measuring overlay in multilayer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Methods and test structures for measuring overlay in multilayer , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Methods and test structures for measuring overlay in multilayer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-213406