Photosensitive member for electrophotography and fabrication pro

Details Photosensitive member for electrophotography and fabrication pro Photosensitive member for electrophotography and fabrication pro

1997-09-05

1999-11-02

Martin, Roland

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 67, 430128, G03G 5147

Patent

active

059767456

ABSTRACT:
With a plasma being generated between a cathode electrode to which a high-frequency power is applied and an electrically conductive substrate opposed to the electrode in a reaction vessel the pressure of which can be reduced, a photoconductive layer having the matrix of silicon atoms is deposited on a substrate to be processed, a surface layer comprised of non-monocrystal carbon containing hydrogen is provided on the photoconductive layer, a surface of the surface layer is etched to fluorinate the surface, the surface roughness Rz by etching is controlled below 1000 .ANG., the fluorine contained in the surface layer is made present within 50 .ANG. from the surface, and the concentration of fluorine to carbon in that region is 20% or more, thereby providing a photosensitive member for electrophotography that can obtain high-quality images free of image faintness and image smearing without using a heating means for the photosensitive member, that has high durability, that shows less change in potential characteristics, that can obtain high-quality images on a stable basis, and that is free of the ghost phenomenon and providing a fabrication process of the photosensitive member.

REFERENCES:
patent: 4265991 (1981-05-01), Hirai et al.
patent: 5582944 (1996-12-01), Yamamura et al.
patent: 5670286 (1997-09-01), Takei et al.
Curtins, et al., Influence of Plasma Excitation Frequency for .alpha.-Si:H Thin Film Deposition, Plasma Chem. and Plasma Process., vol. 7, No. 3, pp. 267-273.

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