Method and apparatus for removing a pellicle frame from a photom

Details Method and apparatus for removing a pellicle frame from a photom Method and apparatus for removing a pellicle frame from a photom

1998-03-13

1999-11-02

Osele, Mark A.

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156584, 294264, 294266, 29239, B32B 3500

Patent

active

059763078

ABSTRACT:
A method and apparatus are disclosed for removing a pellicle frame (52) from a photomask plate (50) where the pellicle frame (52) is adhered to a surface of the photomask plate (50) by an adhesive material (54). Tension is applied to the adhesive material (54) by applying force to separate the pellicle frame (52) and the photomask plate (50). A second surface of the photomask plate (50), opposite from the surface to which the pellicle frame (52) is adhered, is heated to raise the temperature of the adhesive material (54) and to raise the temperature of the photomask plate (50) greater than the temperature of the pellicle frame (52). The tension on the adhesive material (54) is then maintained until the adhesive material (54) releases the pellicle frame (52) from the photomask plate (50).

REFERENCES:
patent: 4255216 (1981-03-01), Conant et al.
patent: 4898058 (1990-02-01), Seifert
patent: 5616927 (1997-04-01), Kubota et al.
patent: 5772842 (1998-06-01), Tanaka et al.

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