Coating apparatus – Control means responsive to a randomly occurring sensed... – Responsive to attribute – absence or presence of work
Patent
1997-11-26
1999-11-02
Edwards, Laura
Coating apparatus
Control means responsive to a randomly occurring sensed...
Responsive to attribute, absence or presence of work
118 50, 118407, 118429, B05C 500
Patent
active
059762560
ABSTRACT:
The film coating apparatus comprising a mounting table for holding an LCD substrate substantially horizontally, a nozzle having a slit-form liquid discharge port extending from one end to the other end of the substrate, coating solution supply mechanism for supplying a resist solution to the nozzle, and moving means for moving the nozzle in parallel to the substrate in the direction perpendicular to the longitudinal direction of the liquid discharge port in such a manner that the liquid discharge port keeps a constant clearance with the substrate. The nozzle comprises an entrance for introducing the resist solution from the resist solution supply mechanism, a liquid storage portion communicating with the entrance and the liquid discharge port, for temporarily storing the resist solution introduced through the entrance and sending the coating solution to the liquid discharge port, and film-thickness control means provided on both peripheral regions of the liquid discharge port, for reducing a pressure of the coating solution discharged from the both peripheral regions of the liquid discharge port. The film-thickness control means controls the pressure of the resist solution discharged from the both peripheral regions to be substantially equal to that from the middle region, thereby forming the resist coating film having a uniform thickness on the substrate.
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patent: 4675230 (1987-06-01), Innes
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patent: 5209954 (1993-05-01), Takahashi et al.
patent: 5335681 (1994-08-01), Schmid
patent: 5755881 (1998-05-01), Fenoglio et al.
Edwards Laura
Tokyo Electron Limited
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