Spin dryer

Drying and gas or vapor contact with solids – Apparatus – With apparatus using centrifugal force

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Details

34 8, F26B 1118

Patent

active

046371460

ABSTRACT:
A spin dryer including a rotary stage for supporting a substrate to be dried, particularly adapted for use in producing semiconductor devices, and a stationary cover spaced from the substrate. The stationary cover has at least the same area as that of the substrate and is provided with a number of openings for charging a dry and dust-free gas onto the substrate, whereby oxidation and dust-contamination of the substrate are avoided.

REFERENCES:
patent: 949930 (1910-02-01), Hutchins
patent: 3740866 (1973-06-01), Williams
patent: 4027686 (1977-06-01), Shortes et al.
patent: 4257637 (1981-03-01), Hassan et al.
patent: 4313266 (1982-02-01), Tam
patent: 4350562 (1982-09-01), Bonu
patent: 4445281 (1984-05-01), Aigoo
K. Schade, "Halbleiter Technologie", vol. 1, 1st edition, 2/1981, VEB Verlag Technik, Berlin, p. 84.
European Search Report.
IBM Technical Disclosure Bulletin, vol. 22, No. 11, Apr. 1980, NY.
IBM Technical Disclosure Bulletin, vol. 17, No. 1, Jun. 1974, NY.

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