Automatic drain collecting and exhausting apparatus for semicond

Details Automatic drain collecting and exhausting apparatus for semicond Automatic drain collecting and exhausting apparatus for semicond

1998-03-26

1999-11-02

Michalsky, Gerald A.

Fluid handling

Diverse fluid containing pressure systems

Main line flow displaces additive from shunt reservoir

137571, F04F 300

Patent

active

059751088

ABSTRACT:
A method and apparatus for automatically collecting and exhausting drainage discharged from a semiconductor fabrication system, including a drainage collector for storing drainage discharged from the semiconductor fabrication system, a drainage tank for storing the drainage output from the drain collector, and a liquid separator provided between the drainage collector and the drainage tank. The drainage collector receives and stores the drainage output from the drain collector. The liquid separator, provided between the drainage collector and the drainage tank, receives and stores the drainage output from the drainage collector under a first condition in accordance with a difference between a vacuum pressure and the atmospheric pressure, and allows the drainage stored in the drainage collector to flow into the drainage tank in a second condition based on a difference between the vacuum pressure and atmospheric pressure. Chemical drainage, such as organic solvent, is exhausted from the system based on a difference in pressure between the vacuum pressure and the atmospheric pressure, enabling a small capacity drain collector to be used.

REFERENCES:
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patent: 5380446 (1995-01-01), Bratten
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patent: 5496469 (1996-03-01), Scraggs et al.
patent: 5575307 (1996-11-01), Martinitz
patent: 5590678 (1997-01-01), Martinitz et al.
patent: 5593596 (1997-01-01), Bratten

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