Photosensitive member having an overcoat layer and process for m

Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product

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430132, G03G 514

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active

048867241

ABSTRACT:
A photosensitive member of the present invention comprises an electrically conductive substrate, a photosensitive layer comprising an organic material and a hydrogen-containing amorphous carbon overcoat layer containing one or more elements selected from the group consisting of chalcogen and elements in Group III, IV and V of the periodic table.
The overcoat layer contains hydrogen in an amount of about 30 to about 60 atomic % based on the combined amount of hydrogen atoms and carbon atoms.

REFERENCES:
patent: 3956525 (1986-05-01), Yasuba
patent: 4366208 (1982-12-01), Akai et al.
patent: 4394425 (1983-07-01), Shimizu et al.
patent: 4490450 (1984-12-01), Shimizu et al.
patent: 4544617 (1985-10-01), Mort et al.
patent: 4749636 (1988-06-01), Iino et al.
patent: 4755444 (1988-07-01), Karakida et al.
patent: 4770966 (1988-09-01), Kazama et al.
patent: 4774130 (1988-09-01), Endo et al.
"Formation of an Amorphous Powder During the Polymerization of Ethylene in a Radio-Frequency Discharge", Journal of Applied Polymer Science, vol. 17, 1973, New York.
A. Dilkes S. Kaplan, and A. Vanlaeken, "A C-NMR Investigation of Plasma Polymerized Ethane, Ethylene, and Acetylene", Xerox Webster Research Center.
W. E. Spear and P. G. Le Comber, "Electronic Properties of Substitutionally Doped Amorphous Si and Ge", Philosophical Magazine, 1976, vol. 33, No. 6,935-949.
"Photosensitive Materials for Electron Photography--OPC vs. Inorganics", Nikkei New Materials, Dec. 15, 1986.
John A. Woolam et al., "Optical and Interfacial Electronic Properties of Diamond-Like Carbon Films".
Mitchell Shen and Alexis T. Bell, "A Review of Recent Advances in Plasma Engineering", Review of Recent Advances, Mar. 29, 1979.

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