Observing apparatus

Details Observing apparatus Observing apparatus

1980-04-14

1983-06-21

Corbin, John K.

350394, 350399, 350503, G02B 2106

Patent

active

043890849

ABSTRACT:
An observing apparatus for observing if a mask for producing semiconductor circuit element and a wafer are aligned to a determined positional relationship. The apparatus is featured in eliminating the light reflected by the mask by the use of a phase mirror and an optical analyzer, thus allowing to observe the mask and wafer without difference in brightness.

REFERENCES:
patent: 3748015 (1973-07-01), Offner
patent: 3853398 (1974-12-01), Kano

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